- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/28 - Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof
Patent holdings for IPC class G03F 1/28
Total number of patents in this class: 17
10-year publication summary
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2
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3
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2
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3
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2
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0
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0
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1
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0
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0
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| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
3 |
| Dai Nippon Printing Co., Ltd. | 3891 |
3 |
| SK Hynix Inc. | 11030 |
2 |
| ULVAC Coating Corporation | 17 |
2 |
| Samsung Electronics Co., Ltd. | 131630 |
1 |
| Panasonic Intellectual Property Management Co., Ltd. | 27812 |
1 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
1 |
| Eulitha AG | 30 |
1 |
| Kioxia Corporation | 9847 |
1 |
| Panasonic Semiconductor Solutions Co., Ltd. | 970 |
1 |
| Shanghai Chuanxin Semiconductor Co., Ltd. | 5 |
1 |
| Other owners | 0 |